Thin Layer Deposition: Highlighting Ion Implantation and Epitaxy: Industry Research

Thin Layer Deposition: Highlighting Ion Implantation and Epitaxy

Published Date: March 2002

Published By: BCC Research

Page Count: 167

Order Code: R2-563

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Ion implantation and molecular beam epitaxy (MBE) are critical technologies in semiconductor manufacturing. Implantation also plays an important role in other industries such as medical devices. This new BCC study highlights the established beamline ion implantation process, the emerging plasma immersion ion implantation process, ion assisted deposition, and MBE. The report covers in depth the applications of these technologies to the semiconductor industry, including thin-film silicon-on-insulator wafers manufactured by ion implantation. The use of ion implantation and ion assisted deposition in the medical and industrial markets is studied as well. Market forecasts of equipment shipments, services provided, and materials used are presented from 2001 to 2006, for both ion implantation and MBE. Other features include profiles of the leading companies worldwide involved in implantation and MBE, and growth trends.

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